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翻訳と辞書　辞書検索 [ 開発暫定版 ] スポンサード リンク Optothermal stability ： ウィキペディア英語版 Optothermal stability Optothermal stability describes the rate at which an optical element distorts due to a changing thermal environment. Therefore, optothermal stability is an issue for optics that are present in a changing thermal environment. Optothermal stability is important for objects in orbit which have varying heating levels from the solar flux, planetary albedo, and planetary infrared emissions. Optothermal stability is important when measuring surface figure of optics because thermal changes are typically of a low frequency nature (diurnal or HVAC cycling) which makes it difficult to use the same methods used to remove errors due to vibrational disturbances. Also, optothermal stability is important for certain optical systems such as those that use a coronagraph which requires a high level of stability. == Material Characterization== Material characterization numbers have been mathematically derived which describe the rate at which a material deforms due to an external thermal input. It is important to note the distinction between wavefront stability (dynamic) and wavefront error (static). A higher Massive Optothermal Stability (MOS) and Optothermal Stability (OS) number will result in greater stability. Both MOS and OS are provided because density is an undesirable substrate material property for non-thermal reasons especially in space operations. MOS and OS are defined below: $MOS\; =\; \backslash over\; \backslash alpha\}$ $OS\; =$ Where ρ, cp, α are density, specific heat, and the coefficient of thermal expansion respectively. 抄文引用元・出典: フリー百科事典『 ウィキペディア（Wikipedia）』 ■ウィキペディアで「Optothermal stability」の詳細全文を読む スポンサード リンク 翻訳と辞書 : 翻訳のためのインターネットリソース Copyright(C) kotoba.ne.jp 1997-2016. All Rights Reserved.